Fortrend successfully concluded participation at SPIE Advanced Lithography + Patterning 2026, held February 24–25, 2026 at the San Jose Convention Center.

The event brought together leading experts in lithography, photonics, and semiconductor manufacturing, providing an important platform for discussing the technologies that enable next-generation chip production. At Booth #700 in Hall 1, Fortrend welcomed engineers, equipment manufacturers, and industry partners to explore its latest advancements in reticle handling and fab automation.

Highlighting EUV Reticle Handling Innovation

One of the key highlights at the Fortrend booth was the company’s EUV SMIF Pod Opener, designed to support the increasingly demanding requirements of advanced lithography processes.

As EUV lithography continues to drive semiconductor scaling, reticle handling systems must maintain exceptional cleanliness, alignment precision, and operational stability. Fortrend’s reticle automation solutions are engineered to address these challenges by delivering:

● High-precision reticle loading and transfer

● Contamination-controlled reticle SMIF environment

● Reliable integration with reticle EFEM and sorter platforms

● Consistent performance for high-throughput fab operations

The showcased system demonstrated how carefully engineered automation platforms can help fabs maintain process stability while supporting the stringent requirements of EUV production environments.

Load Port Solutions and Custom Automation Platforms

In addition to reticle handling technologies, Fortrend also presented load port solutions and customized automation platforms designed for semiconductor equipment integration.

Visitors had the opportunity to discuss application scenarios involving:

● Reticle EFEM systems

● Reticle sorting and storage automation

● Fab-level automation integration

● Custom solutions tailored to specific process tools

These discussions highlighted the growing demand for flexible automation architectures capable of adapting to different equipment configurations and production workflows.

Building on Decades of Industry Experience

Since its founding in 1979, Fortrend has continuously evolved alongside the semiconductor industry. Throughout SPIE 2026, many conversations centered on how today’s most advanced technologies are often built upon automation solutions that have proven their reliability over decades of use.

Fortrend remains committed to providing dependable automation platforms that support both established manufacturing processes and emerging semiconductor technologies.

Thank You for Visiting Fortrend at SPIE 2026

SPIE Advanced Lithography + Patterning 2026 provided a valuable opportunity to connect with engineers, partners, and innovators from across the semiconductor ecosystem.

Fortrend would like to thank everyone who visited Booth #700 to explore the latest automation solutions, view product demonstrations, and discuss future collaboration opportunities.

We look forward to continuing these conversations and meeting again at future industry events as we work together to advance semiconductor manufacturing through smarter automation.