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F: Fortrend
W: Wafer
P: PLP substrate
M: Mask
C: Cassette
H: Humid
R: Robot
D: Arm Qty.
S: Single arm
D: Dual-arm
A*: X(X:Number of Arms)
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Axis-Z Height
240mm
300mm
400mm
500mm
Z*XXX (Customized)
LZ: Compact Lifting Height
240mm
300mm
400mm
500mm
LZ*XXX（Customized）
Dual-Z
ZD600mm
ZD700mm
ZD800mm
ZD*XXX (Customized)
Module-based
MZXXX
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Drive Arm R Length
146mm
190.5mm
213mm
Eccentric ER (optional)
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Special Module
Rta: Single arm FLiP
Rta2: Double Arm Up FLIP
Rta2: Double Arm Down FLIP
RtaD: Double arm double FLip
FR: wafer frame
No Options
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End-effector Type
Ata: Vacuum suction
Cta: Edge gripper
Han: Clamp lift type
Ber1: Contact Bernoulli
Ber2: Non-Contact Bernoulli
Customer Customization
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Fork Type
F: Original fork
No Options
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Wafer Size
4″ / 6″ / 8″ / 12″
N*: Non-wafer object
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Matching Options
M:
M1: Opposite-shooting Mapping Quantity 1
M2: Opposite-shooting Mapping Quantity 2
M*: Mapping Quantity 1
No Options
R:
R: Original teach pendant
No Options
TX:
T: Original Track axis
X: TRACK axis effective distance/mm
No Options
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Special Customization
Have: Special Model
None: Normal Device
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